Monolayer Graphene on 300 nm SiO₂/Si Choose Your Size:10 mm x 10 mm - Pack 4 units · Optical Microscopy inspection of

· Optical Microscopy inspection of each individual sample to ensure good transfer quality and purity

mGFETs can be tuned to be sensitive only to the stimulus of interest and have shown breakthrough performance in areas such as graphene device research

If your application requires more specific quality control (AFM

biosensors

· Grain size: Up to 20 μm

Monolayer Graphene on 300 nm SiO₂/Si Choose Your Size:10 mm x 10 mm - Pack 4 units · Optical Microscopy inspection ofMonolayer Graphene on 300 nm SiO Si Fully Covered Processed in ISO 7 Cleanroom Our monolayer graphene on SiO Si (fully covered) is a bidimensional material produced by CVD and transferred to a circular substrate of SiO Si (300nm) by a semi dry transfer process. We consider it to be a benchmark product in the graphene market not only for its excellent quality, but also for its shape, size and number of applications. Graphene Film Growth method: CVD